2-step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance.
نویسندگان
چکیده
Amorphous SiO(2) membranes were prepared via a 2-step plasma-enhanced CVD (PECVD) technique at room temperature on porous TiO(2)/Al(2)O(3) substrates. SiO(2) membranes showed molecular sieving properties with a high separation factor for He/N(2) and He/H(2), and high thermal stability, indicating the successful preparation of high-performance membranes at low temperatures.
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ورودعنوان ژورنال:
- Chemical communications
دوره 47 28 شماره
صفحات -
تاریخ انتشار 2011